Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-68318 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J2301-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J2201-622 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J2203-326 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-6834 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-68327 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-68381 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-68386 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J7-0225 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6835 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 |
filingDate |
2015-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2017-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b6a6d24832d58f3686b75c74af5eab05 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_41a4c349a9504fc151eb61aea309c99f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a7f343bafb31fb269cc585c1a8032d58 |
publicationDate |
2017-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-9716025-B2 |
titleOfInvention |
Temporary bonding laminates for use in manufacture of semiconductor devices |
abstract |
Provided is temporary bonding laminates for used in a manufacture of semiconductor devices, by which a member to be processed (a semiconductor wafer or the like) can be temporarily supported securely and readily during a mechanical or chemical process of the member to be processed and then the processed member can be readily released from the temporary support without damaging the processed member even after a high temperature process, and processes for manufacturing semiconductor devices. The temporary bonding laminate includes (A) a release layer and (B) an adhesive layer, wherein the release layer (A) comprises (a1) a first release layer having a softening point of 200° C. or more and adjoining the adhesive layer (B), and (a2) a second release layer adjoining the first release layer (a1); the second release layer (a2) contains a resin; and the resin after curing has a capable of being dissolved at 5% by mass or more, at 25° C., in at least one kind of solvents selected from hexane and the like. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-D856007-S http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-D857405-S |
priorityDate |
2013-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |