| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_845cb85e2ff428ac0c635d5790e775ba
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7657e330ad716001ec1e73957a43ddfd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e01544ac3dfae0b7c761b3a4fbc51ebd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_370f099c39efce82f1516157a8722aed
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0751
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L43-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-5419 |
| filingDate |
2012-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-01-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d335f523de9c6743592ee54bba1ba083
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8112a52b9b2a875c594a90d295b2a41b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b49a3e732d07664bda2131d4a1eda10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07c6f2ac52f7b471a4a5758f0ee3d639 |
| publicationDate |
2015-01-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8932953-B2 |
| titleOfInvention |
Composition for forming a silicon-containing resist underlayer film and patterning process using the same |
| abstract |
A composition for forming a silicon-containing resist underlayer film that contains: a component (A) including at least one or more compounds selected from the group consisting of a polymer having repeating units shown by the following general formulae (1-1a) and (1-1b) and being capable of generating a phenolic hydroxyl group, a hydrolysate of the polymer, and a hydrolysis-condensate of the polymer, and a component (B) which is a silicon-containing compound obtained by hydrolysis-condensation of a mixture containing, at least, one or more hydrolysable silicon compounds represented by the following general formula (2) and one or more hydrolysable silicon compounds represented by the following general formula (3). n R 11 m11 R 12 m12 R 13 m13 Si(OR 14 ) (4−m11−m12−m13) (2)n nSi(OR 15 ) 4 (3) |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9971245-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014193975-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10114288-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016229939-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10007184-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9377690-B2 |
| priorityDate |
2011-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |