| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1eb9cd2af2f87dcf20b0fbbdfe79996e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 |
| filingDate |
2004-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2006-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a4a8d1b39ab6d9c864c486be2addbb7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_19d7872ec1c41e19077934a2bb18d62e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bcc6440c64f39085c3cdf5560c8ce980
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0488a3b42fea36c2be714dd957c665bf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5957053e81aa7ed2fdbe4c1c5b74626f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a0e3264704e77e2989fcb37657d86cfd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_76e3fc76be010dc2296dacf624d2b96e |
| publicationDate |
2006-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7067440-B1 |
| titleOfInvention |
Gap fill for high aspect ratio structures |
| abstract |
Chemical vapor deposition processes are employed to fill high aspect ratio (typically at least 3:1), narrow width (typically 1.5 microns or less and even sub 0.15 micron) gaps with significantly reduced incidence of voids or weak spots. This deposition process involves the use of hydrogen as a process gas in the reactive mixture of a plasma containing CVD reactor. The process gas also includes dielectric forming precursor molecules such as silicon and oxygen containing molecules. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8133797-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10943779-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10580617-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7951683-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7217658-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7229931-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011168966-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8017432-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7476621-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005282398-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9530674-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009286381-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011108792-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10096453-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7344996-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7482245-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7381451-B1 |
| priorityDate |
2001-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |