| abstract |
The present invention provides a method of forming a conductive pattern, comprising the steps of: n (1) depositing a conductive coating-forming resin layer and an energy beam-sensitive coating layer on a substrate in this order; n (2) irradiating a surface of the energy beam-sensitive coating layer with an active energy beam or heat rays directly or through a mask, so as to obtain a desired pattern; n (3) developing the energy beam-sensitive coating layer to form a resist pattern coating from the energy beam-sensitive coating layer; and n (4) removing revealed portions of the conductive coating-forming resin layer by development. n The present invention also provides a method of forming a conductive pattern, comprising the step (1), the step (2), and the step of: n (3′) developing the energy beam-sensitive coating layer and the conductive coating-forming resin layer simultaneously. |