http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6204201-B1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c35b72d5b17e31ff1ccab2d9a0a02161
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76829
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5329
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-0263
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-0272
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76801
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02351
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76825
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-0209
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-318
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-314
filingDate 1999-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2001-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60e68b8ba4d6eb47f0ad1707ec2b3dc7
publicationDate 2001-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6204201-B1
titleOfInvention Method of processing films prior to chemical vapor deposition using electron beam processing
abstract A process for the treatment of the surface of dielectric films to remove moisture and other contaminants. Such treatment is done by electron beam exposure in order to prepare the surface for a subsequent chemical vapor deposition of oxide, nitride or oxynitride layers. The films are useful in the manufacture of integrated circuits.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3121310-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2116632-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6936551-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8137764-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8399349-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006006541-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7399715-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3872223-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3358602-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005227502-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2306499-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004033371-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8846522-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006183055-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6605549-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9018108-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6902771-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7425716-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003205823-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005230834-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006043591-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005130404-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8951342-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005224722-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006024980-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006041052-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7422776-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7611996-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003104225-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8268403-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9061317-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7893538-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3231892-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021034641-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7026053-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003232495-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005260420-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7291567-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006228889-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6548899-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008038934-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003134039-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004241463-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008038527-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005042464-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9574108-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6797607-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7256139-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2657365-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2958135-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007088908-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9922818-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010007025-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7932295-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10395920-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7309514-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1848032-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005062164-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006192150-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2281920-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3211121-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008246153-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003157340-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3476971-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2261390-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018057938-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7547643-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1354980-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008105978-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6647995-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1666632-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002168876-A1
priorityDate 1999-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5801094-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4222792-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4944836-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID123880120
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10403
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8452
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID123155189
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID135866475
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID128173737
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID123640757
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID136066893
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID135873670
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID123225839
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID455631711
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID123490398
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID127513473
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID136017815
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID123214805
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID135828383
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID136125662

Total number of triples: 124.