| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3a62c92e56568bd104089aac22ca487b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-2817 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-28 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01Q60-00 |
| filingDate |
2000-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2001-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_871ceb5a6245c19728d32344b5bc3ed6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e529236bbf9761359a38877f3aa454ec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3559a9d8bdbcd25fc9436b9330918dbd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8ca1fa6608cd5aca1a7dc7440a4a6ec5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f3d89cf30076945d7efb1bdb3b9eb5ba
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_455e28e029a476283a23add4190a472d |
| publicationDate |
2001-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6190062-B1 |
| titleOfInvention |
Cleaning chamber built into SEM for plasma or gaseous phase cleaning |
| abstract |
One aspect of the present invention relates to a method of inspecting a patterned substrate using an SEM, involving the steps of evaluating the patterned substrate to determine if charges exist thereon; introducing the patterned substrate having charges thereon into a processing chamber of the SEM; inspecting the patterned resist using an electron beam generated by the SEM; and introducing a cleaner containing ozone into the processing chamber of the SEM. Another aspect of the present invention relates to a system for processing a patterned substrate, containing a charge sensor for determining if charges exist on the patterned substrate and measuring the charges; a means for contacting the patterned substrate with a cleaner containing ozone to reduce the charges thereon; a controller for setting at least one of time of contact between the patterned substrate and the cleaner, temperature of the cleaner, concentration of ozone in the cleaner, and pressure under which contact between the patterned substrate and the cleaner occurs; and a device for inspecting the patterned substrate with an electron beam. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10578981-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007105397-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11733186-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021247336-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7629578-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8679307-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1826808-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022291255-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004108067-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007194228-A1 |
| priorityDate |
2000-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |