http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S63188942-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d7576285d411d00c697e07270d2814a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-00 |
| filingDate | 1987-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f4e3acbfb3f5be56c8df0466fb4955b |
| publicationDate | 1988-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S63188942-A |
| titleOfInvention | System for photosetting resist |
| abstract | PURPOSE: To oxidize a scum generated on a wafer and to remove it by a method wherein an oxidative gas is introduced into a chamber in which the wafer containing a resist pattern and the scum is put. n CONSTITUTION: A wafer 6 where a resist pattern and a scum are generated is put in an airtight chamber 5; oxygen gas is introduced through an oxidative- gas inlet 7. A high-pressure mercury lamp 11 is turned on; the wafer 6 is irradiated with extreme ultraviolet rays. The oxygen gas is excited by the extreme ultraviolet rays and is transformed into ozone gas; this gas oxidizes the surface of a resist on the wafer and slightly removes it. Then, the oxygen gas and the ozone gas are removed through an outlet 9 by vacuum evacuation; nitrogen gas is introduced through an inactive-gas inlet 8; the surface of the resist is irradiated with the extreme ultraviolet rays in a nitrogen atmosphere; the resist is photoset. Accordingly, two processes for removing the scum and for photosetting can be executed in an identical system; it is not required to install a system for removal of the scum separately. n COPYRIGHT: (C)1988,JPO&Japio |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H02275618-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6190062-B1 |
| priorityDate | 1987-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.