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filingDate 1989-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1990-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6a9ea15f127b1a8f8535fe1948cea95
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7336ce88d6ee02bfd024ba1ee93ed54b
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publicationDate 1990-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-4943511-A
titleOfInvention High sensitivity mid and deep UV resist
abstract Positive photoresist compositions are provided which contain (a) a mixture of mono-, di-, and triesters of 2,3,4-trihydroxybenzophenone and 1,2-naphthoquinone-2-diazo-4-sulfonic acid and (b) a novolak resin selected from resins prepared from a phenolic component having a high p-cresol content or from a mixture of formaldehyde and an aromatic aldehyde.
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