http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5338653-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9161aebc19a284f75a386fe9e3b984d8 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-08 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate | 1994-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 1994-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8ecc31963e38bb975854fc0c852f2779 |
| publicationDate | 1994-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-5338653-A |
| titleOfInvention | Phenolic novolak resin compositions containing 5-indanol and their use a process for forming positive resist patterns |
| abstract | A phenolic novolak resin composition comprising a condensation product of at least one aldehyde source with a phenolic source comprising 5-indanol. Said phenolic novolak resins are used in radiation-sensitive compositions, especially those useful as positive-working photoresists. |
| priorityDate | 1993-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 189.