patent/US-4574095-A

http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4574095-A

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filingDate	1984-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate	1986-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor	http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_98403a2734a99287afe3711b5bd40b59 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fcd8442c19a709cca2f1ddbd1d4f717f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8fc78eb6609f1bdc601221351f44573 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4eb289bf72ed568573d9559821a3df87
publicationDate	1986-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber	US-4574095-A
titleOfInvention	Selective deposition of copper
abstract	A process for selectively depositing copper by first selectively depositing palladium seeds by irradiating a palladium compound with light. Following the deposition of the palladium seeds, copper is deposited by an electroless process.
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Total number of triples: 186.