Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cde17aeba1ca279f803521f66d5d8b9e http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4f27eecefe712eec9c0260cda95222cf http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3e7398f051a5068eaf4e3afcc1b5190a http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1aacebc8727a44ab24b1411a247053da |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02343 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02359 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02203 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76814 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-485 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76826 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76831 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-485 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
filingDate |
2011-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1469ba1fc26efc174738b4d75163ea98 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_807e93ff5511c3ee7c14d37d83b63d81 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f82ed44abbf1ed7b3dcb25d47a97aa3d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e75b65b7d2614ff289c80ea0400c22aa |
publicationDate |
2013-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2013320520-A1 |
titleOfInvention |
Chemically altered carbosilanes for pore sealing applications |
abstract |
A method including forming a dielectric material including a surface porosity on a circuit substrate including a plurality of devices; chemically modifying a portion of the surface of the dielectric material with a first reactant; reacting the chemically modified portion of the surface with a molecule that, once reacted, will be thermally stable; and forming a film including the molecule. An apparatus including a circuit substrate including a plurality of devices; a plurality of interconnect lines disposed in a plurality of layers coupled to the plurality of devices; and a plurality of dielectric layers disposed between the plurality of interconnect lines, wherein at least one of the dielectric layers comprises a porous material surface relative to the plurality of devices and the surface comprises a pore obstructing material. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018125201-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10062564-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10714604-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9406615-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9887161-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9576848-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2884523-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018114719-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9117666-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016172189-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9881833-B1 |
priorityDate |
2011-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |