| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7bb1ac0effc475b4465efef5039e8c3f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_679fc7858d46067382eebecbd83c1596 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02263
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24 |
| filingDate |
2008-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_42b60466a29c1b5d6664b57c5e2d212d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_76e1cad4d87b941e68e4f1e2a51ba6f0 |
| publicationDate |
2009-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2009017231-A1 |
| titleOfInvention |
Novel silicon precursors to make ultra low-k films with high mechanical properties by plasma enhanced chemical vapor deposition |
| abstract |
A method for depositing a low dielectric constant film on a substrate is provided. The low dielectric constant film is deposited by a process comprising reacting one or more organosilicon compounds and a porogen and then post-treating the film to create pores in the film. The one or more organosilicon compounds include compounds that have the general structure Si—C X —Si or —Si—O—(CH 2 ) n —O—Si—. Low dielectric constant films provided herein include films that include Si—C X —Si bonds both before and after the post-treatment of the films. The low dielectric constant films have good mechanical and adhesion properties, and a desirable dielectric constant. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012064491-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103210479-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012064491-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021527956-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010052115-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3682041-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102555932-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7230067-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8298965-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210008172-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8932674-B2 |
| priorityDate |
2007-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |