| abstract |
Provided herein are methods of forming a metal oxide layer that include providing an organometallic compound and an oxidizing agent to the substrate to form the metal oxide layer on the substrate. The organometallic compound may have the general formula of M(NR 1 R 2 ) 3 R 3 , wherein M is a metal; R 1 and R 2 are each independently hydrogen or alkyl; and R 3 is selected from the group consisting of alkyl, cycloalkyl, heterocycloalkyl, aryl and heteroaryl. |