| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_efa621aa19e88304c0ea4975ba936a88 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32522 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
| filingDate |
2003-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21b8eea7525ba02f9a922e1b6ad1a842 |
| publicationDate |
2005-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2005224178-A1 |
| titleOfInvention |
Heating jacket for plasma etching reactor, and etching method using same |
| abstract |
In a reactor of the invention, the reaction chamber ( 1 ) is defined by a leakproof wall ( 2 ) protected by a heater liner ( 14 ). The heater liner ( 14 ) is raised to a temperature higher than the condensation temperature of the polymers that are generated during the passivation step of an alternating plasma etching method so as to avoid depositing polymer on the leakproof wall ( 2 ) of the reaction chamber ( 1 ) or on the heater liner ( 14 ) itself. As a result, etching speed is kept constant. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8673785-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8343876-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007066038-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105957792-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010159707-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2005112093-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7708859-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005241763-A1 |
| priorityDate |
2002-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |