http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2001052456-A1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3408 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35 |
filingDate | 2001-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a36968f03a618b3216081925702f4a3 |
publicationDate | 2001-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | US-2001052456-A1 |
titleOfInvention | Self Ionized Plasma Sputtering |
abstract | A magnetron especially advantageous for low-pressure plasma sputtering or sustained self-sputtering having reduced area but full target coverage. The magnetron includes an outer pole of one magnetic surrounding an inner pole of the other polarity with a gap therebetween. The magnetron is small, primarily located on one side of the central axis, about which it is rotated. The total magnetic flux of the outer pole is at least 1.5 times that of the inner pole. Different shapes include a racetrack, an ellipse, an egg shape, a triangle, and a triangle with an arc conforming to the target periphery. The invention allows increased ionization of the sputtered atoms. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7335282-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007039545-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005051424-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6790323-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109207943-A |
priorityDate | 1999-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 30.