| abstract |
A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group, Va 1 is a divalent hydrocarbon group, n a1 represents an integer of 0 to 2, Ya 0 is a carbon atom, Xa 0 is a group forming a monocyclic aliphatic hydrocarbon group together with Ya 0 , and Ra 00 is an aromatic hydrocarbon group or a specific unsaturated hydrocarbon group. In general formula (b1), R b1 represents a cyclic hydrocarbon group, Y b1 represents a divalent linking group containing an ester bond, V b1 represents an alkylene group, a fluorinated alkylene group, or a single bond, and M m+ is an m-valent organic cation. |