| abstract |
A copolymer comprising the polymerized product of an electron-sensitizing acid deprotectable monomer, such as the monomer having the formula (XX), and a comonomer: n n n n n n n n n n wherein R a is H, F, —CN, C 1-10 alkyl, or C 1-10 fluoroalkyl; R x and R y are each independently a substituted or unsubstituted C 1-10 alkyl group or C 3-10 cycloalkyl group; R z is a substituted or unsubstituted C 6-20 aromatic-containing group or C 6-20 cycloaliphatic-containing group; wherein R x and R y together optionally form a ring; and wherein at least one of R x , R y and R z is halogenated. A photoresist and coated substrate comprising the copolymer, and a method of making an electronic device using the photoresist, are also disclosed. |