| abstract |
(57) [Summary] (With correction) [Solution] A polymer compound having a group represented by (1). (R 1 is a fluorine atom or a fluorinated alkyl group, R 2 is a hydrogen atom or a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms. R 3 and R 4 are a hydrogen atom, a fluorine atom, or a carbon number. A linear, branched or cyclic alkyl group or a fluorinated alkyl group having 1 to 20. R 3 and R 4 may form a ring, in which case, the linear or branched alkyl group has 1 to 20 carbon atoms, respectively. A or b is an integer of 0 to 2; c is an integer of 1 to 3; a + b + c = 3; k is an integer of 1 to 5; It is an integer of 0 to 4 and k + k '= 5.) [Effect] The resist material is excellent in sensitivity to high energy rays, particularly those having a wavelength of 170 nm or less, and plasma etching resistance is improved by introducing a fluorine-containing aromatic ring. Improve and at the same time excel Having resolution. |