http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19980050124-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76885 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205 |
| filingDate | 1996-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1998-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-19980050124-A |
| titleOfInvention | Metal wiring formation method of semiconductor device |
| abstract | The present invention relates to a method for forming a metal wiring of a semiconductor device, in order to have a high etching selectivity with respect to the photosensitive film when forming the tungsten wiring, the increase of the source power, the decrease of the bias power and the ratio of the etching gas during the etching parameters Technology to improve the etching selectivity. In addition, when the etching selectivity for the photoresist film is increased in the same manner as above, the etching process is performed at a low temperature to solve a problem in which recesses rounded to the inner wall of the metal wiring are generated. This allows the formation of metal wires with vertical sidewall profiles. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100399442-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100555484-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100553299-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100307629-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6893970-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100425467-B1 |
| priorityDate | 1996-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 39.