http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S6314421-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_be055db3c1a09879df07379ba969e223 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate | 1986-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd6955ee47e44cfd23353867a1fe5f06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_08943a387f16df8cdbea600bf59dd6e3 |
| publicationDate | 1988-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S6314421-A |
| titleOfInvention | Plasma chemical vapor deposition method |
| abstract | PURPOSE: To perform a plasma cleaning operation on the ineffective film adhered to the component parts in the vacuum chamber of a plasma CVD device in an excellent reproducible manner by a method wherein said plasma cleaning operation is performed while the light-emission spectrum intensity of the specific atoms or molecules is being monitored. n CONSTITUTION: When a plama cleaning operation is performed on the component parts in the reaction chamber 41 of a plasma CVD device, the intensity of the light-emission spectrum of specific atoms or molecules is to be monitored simultaneously. For example, a silicon nitride film is formed on the surface of a sample 42 using the plasma CVD device, and after the sample 42 has been picked out from the vacuum chamber 41, the vacuum chamber 41 is evacuated, SF 6 gas is introduced from a gas flow-rate controlling device 47 and low temperature plasma is generated. Also, a plasma light is introduced to a spectroscope 54 from a window 52, the nitride atoms of wavelength of 674 nm are monitored by a detector 56, they are introduced to a recording meter through the intermediary of an amplifier 57. Then, when the light-emission spectrum density is deteriorated to the prescribed value, the plasma cleaning operation is finished. n COPYRIGHT: (C)1988,JPO&Japio |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010170652-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006512769-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8900363-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006512770-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4763294-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100402202-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5712702-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008050596-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100475078-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6737666-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7939388-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03067638-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4763293-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6149984-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2008050596-A1 |
| priorityDate | 1986-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.