| abstract |
(57) Abstract: A resist material used for forming a fine pattern and a method of patterning the resist are to improve both resolution and sensitivity. A polymer containing a substituent that is decomposed by an acid, an acid generator that generates an acid by irradiation with ionizing radiation, Quinukiridine or 1,4-diazabicyclo- [2,2, 2] a step of applying a resist 3 containing a salt composed of octane or a derivative thereof and an acid onto the underlayer 2, a step of exposing the resist 3 using ionizing radiation, and developing the resist 3 with an aqueous alkaline solution And a process. |