| abstract |
(57) [Abstract] (with correction) [PROBLEMS] An anti-reflection film capable of forming a resist pattern with good film formability, fineness, high dimensional accuracy and alignment accuracy, high productivity, and high reproducibility. Furthermore, since the acid on the surface of the chemically amplified resist is not deactivated, the above PED problem does not occur, and therefore, in the case of the chemically amplified resist, a material for the resist upper layer which functions as a protective film is made of CFC. Provide without doing. SOLUTION: a) at least one water-soluble polymer selected from the group consisting of a poly (N-vinylpyrrolidone) homopolymer and a water-soluble copolymer of N-vinylpyrrolidone and another vinyl monomer; A water-soluble film material for forming an upper layer of a resist layer, comprising: an aqueous solution containing b) at least one fluorine-containing organic acid and c) at least one amino acid derivative. |