| abstract |
(57) [Summary] [Purpose] It is possible to prevent deterioration of pattern dimensional accuracy due to interference of irradiation light with light reflected from the substrate in the photoresist film, and prevent corrosion of equipment such as coating equipment. Provided is a resist coating liquid for forming an interference prevention film having no coating unevenness on a photoresist film, and a resist material using the same. [Structure] A coating solution for resist is prepared by containing a water-soluble film-forming component and a specific fluorine-containing surfactant, or the water-soluble film-forming component, the fluorine-containing surfactant and an anion represented by a specific chemical formula. An ionic surfactant is added to form a resist coating solution, or the water-soluble film-forming component, a fluorine-based surfactant, and an anionic surfactant represented by a specific chemical formula are further N-alkyl-containing. 2-Pyrrolidone is added to obtain a resist coating solution. Further, an interference prevention film made of these resist coating liquids is formed on the surface of the photoresist film to obtain a two-layer structure resist material. |