| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_730848fc69ca7afca2b3c3e10b6cfd92 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 |
| filingDate |
2001-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2007-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c877bc03b7c9914370698df7918c243e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_75acf6944999dbe4a0f7b15231011bc2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_810a7ed3f6db26ab3889c880271ea2f2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96f524b8f62abd0f2f84aef0ec237209
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea47df43613fee249028bc9faafec084 |
| publicationDate |
2007-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7195863-B2 |
| titleOfInvention |
Development defect preventing process and material |
| abstract |
A composition for reducing development defects comprising an acidic composition containing, for example, a surfactant applied onto a chemically amplified photoresist coating formed on a substrate having a diameter of 8 inches or more. By this process, the surface of the resist is rendered hydrophilic and the formation of slightly soluble layer in a developer on the surface of the resist is prevented. In addition, by proper diffusion amount of acid from the composition for reducing development defects, the amount of reduction in thickness of the chemically amplified photoresist coating after development is increased by 10 Å to 500 Å in comparison with the case of not applying the composition for reducing development defects to form a resist pattern not having a deteriorated pattern profile such as T-top or round top. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8008358-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8349549-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010129758-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8247162-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9392688-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010266966-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9557652-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008149878-A1 |
| priorityDate |
2000-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |