Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate |
2009-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d89d07d230ca200e242f2ab4f27c817a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d8eb0423c882e0be7f0ca48a9635f1a4 |
publicationDate |
2010-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2010129758-A1 |
titleOfInvention |
Resist surface modifying liquid, and method for formation of resist pattern using the same |
abstract |
Provided are: a resist surface modifying liquid which is used as a surface treatment liquid of a resist film prior to a post exposure baking (PEB) step, and which can inhibit occurrence of defects of the resist film by reducing water repellency; and a method for forming a resist pattern using the same. A resist surface modifying liquid which is used as a surface treatment liquid prior to a post exposure baking (PEB) step of a resist film, the resist surface modifying liquid containing an acidic compound, and at least one of an alcohol-based solvent represented by a certain general formula and an ether-based solvent represented by a certain general formula. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010297551-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9105476-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8808970-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8530134-B2 |
priorityDate |
2008-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |