| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3346 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C15-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C15-00 |
| filingDate |
1994-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e414b27e107853c28f7e513fdbb29fc5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b884390ab49dab0bd72213f8bfa4654
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25f338654239647c5bda5cb7c69d50d9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea731964213b947532e7adb64d23fa30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a4b01100619150cd6855dd8ca7a9b26a |
| publicationDate |
1995-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H0774145-A |
| titleOfInvention |
Surface treatment method and surface treatment apparatus |
| abstract |
(57) [Abstract] [Purpose] To improve the etching selectivity in semiconductor processes using fluorocarbon gases. [Features] A feature of the present invention is that the energy incident on the substrate is controlled to an energy value that shifts from etching to deposition on the silicon nitride film, and ions having (CF 2 ) n + as a main component are guided onto the substrate. Thus, the silicon oxide film is selectively etched with respect to the silicon nitride film. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001176849-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016048771-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005285942-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5928963-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-RE44292-E
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0776032-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H10189537-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-RE39895-E |
| priorityDate |
1993-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |