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filingDate 1991-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6d4626b874c76d40c0f62cef6e62d8dc
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publicationDate 1992-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H04226461-A
titleOfInvention Liquid application type aqueous-processable photoresist composition
abstract PURPOSE: To obtain the photoresist having high sensitivity and high resolution by using a (tertiary-butyl methacrylate)/(methyl methacrylate)/(methacrylic acid) polymer binder and an initiator that generates an acid when it is exposed to radiation, as components of the composition. n CONSTITUTION: In this composition, the film-forming polymer binder used is an acrylic polymer that has acid-convertible side chains and is capable of forming a photoresist by allowing it to react with a selected luminescent agent through chemical-sensitizing reaction. Polymer chains of the polymer binder consist of a first monomer that provides a polymer main chain with the acid- sensitive side chain groups, a second monomer that is selected from alkyl methacrylates, alkyl acrylates and combinations of them, and a third monomer that is selected from acryl-based carboxylic acids and methacryl-based carboxylic acids. n COPYRIGHT: (C)1992,JPO
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Total number of triples: 49.