Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-123 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-73 |
filingDate |
2003-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2009-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5fa01dd042e4435f4e9e89f0e3f9ff69 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30a39e540e419bb09c6cc76ad65e7dc9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3767f1c4003a6be9af0d311b7961d488 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b289eaf101a7e3efed3d5e52a5afb898 |
publicationDate |
2009-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-7531286-B2 |
titleOfInvention |
Radiation-sensitive resin composition |
abstract |
1. A radiation-sensitive resin composition comprising: (A) a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid and (B) a photoacid generator. The resin comprises (a) at least one recurring unit of the following formula (1-1) or (1-2), n nand (b) at least one recurring unit for the following formula (2-1), (2-2), or (2-3). |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009269706-A1 |
priorityDate |
2002-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |