| abstract |
PROBLEM TO BE SOLVED: To control plasma distribution at high speed. A plasma processing apparatus includes a processing container, a plurality of first electrodes, a second electrode, a power supply source, a distribution setting unit, and a control device. Each of the first electrodes is provided in the processing container and is supplied with high frequency power. The second electrode is provided inside the processing container and functions as a counter electrode of the first electrode. The power supply source supplies high-frequency power to the plurality of first electrodes to generate plasma between the first electrode and the second electrode, and the processed object is processed using the generated plasma. To do. The distribution setting unit is provided between the power supply source and the at least one first electrode, and sets the distribution of the high frequency power supplied from the power supply source to each of the first electrodes. Further, the distribution setting unit has a plurality of series circuits in which the impedance circuit and the switch element are connected in series. The plurality of series circuits are connected in parallel. The control device controls the switch element of each series circuit. [Selection diagram] Figure 2 |