| abstract |
[MEANS FOR SOLVING PROBLEMS] A polymer compound serving as a base resin whose alkali solubility is improved by an acid, and a (meth) acrylic acid ester each having an aromatic-containing group having 12 to 20 carbon atoms excluding an acenaphthyl group as a polymer additive And repeating units derived from one or more monomers selected from vinyl ethers, vinyl fluorenes, vinyl anthracenes, vinyl pyrenes, vinyl biphenyls, stilbenes, styryl naphthalenes, dinaphthyl ethylenes and at least one fluorine atom A resist material comprising a polymer compound copolymerized with a repeating unit. The photoresist film formed using the resist material of the present invention can reduce the generation of outgas from the resist film in EUV exposure, and the resist film after development can be made hydrophilic by making the resist film surface hydrophilic. The occurrence of the upper blob defect can be prevented. [Selection figure] None |