| abstract |
A resist material comprising a polymer compound having a repeating unit having a sulfonium salt represented by the following general formula (1). (R 1 is a hydrogen atom or a methyl group, R 2 is a phenylene group, —O—R 6 —, or —C (═O) —Y—R 6 —. Y is an oxygen atom or NH, and R 6 is an alkylene group or An alkenylene group or a phenylene group, which may contain a carbonyl group, an ester group, an ether group or a hydroxy group, and R 3 and R 4 are an alkyl group, which contains a carbonyl group, an ester group or an ether group. Or an aryl group, an aralkyl group or a thiophenyl group, wherein X − is an imido acid anion or a methide acid anion having at least one fluorine atom.) [Effect] The resist material to which the acid generator of the polymer type sulfonium salt of the present invention is added has particularly high resolution, high sensitivity and low line edge roughness. [Selection figure] None |