| abstract |
Provided is a salt as an acid generator that provides a resist composition for lithography exhibiting good resolution. A salt represented by formula (IA). [Q 1 and Q 2 are F or a perfluoroalkyl group; X 1 is a saturated hydrocarbon group which may have a substituent; Y 1 ′ is an aliphatic which may have a substituent; An alicyclic, aromatic hydrocarbon group, wherein Y 1 ′ does not include a vinyl group, a (meth) acryloyl group, or a (meth) acryloyloxy group; R a1 to R a13 each represent H, a halogen atom or a substituent; Alternatively, a ring may be formed, and one or more groups among R a1 to R a13 represent a vinyl group, an acryloyl group, and the like; Z represents a single bond or a divalent linking group. ] [Selection figure] None |