http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013028794-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-30 |
filingDate | 2012-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fcb142bcea5ae883356b016617eda596 |
publicationDate | 2013-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2013028794-A |
titleOfInvention | Compound, resin, resist composition, and method for producing resist pattern |
abstract | A compound capable of producing a resist pattern having excellent focus margin (DOF) and few defects is provided. A compound represented by formula (I). [In Formula (I), R 1 represents a hydrogen atom or a methyl group. A 1 represents the formula (a-g1) In formula (a-g1), Y 1 represents a divalent organic group containing an anthracene ring, a fluorene ring, or a phenanthrene ring. R 2 represents a fluorinated alkyl group having 1 to 12 carbon atoms. ] [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014067013-A |
priorityDate | 2011-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 245.