abstract |
Negative pattern capable of forming a pattern with excellent focus margin (DOF), local pattern uniformity and resolution even in pattern formation having various shapes including contact hole patterns To provide a forming method, a method for producing an electronic device including the pattern forming method, an electronic device, and an actinic ray-sensitive or radiation-sensitive resin composition. SOLUTION: (a) a step of forming a film comprising an actinic ray sensitive or radiation sensitive resin composition, (b) a step of exposing the film, and (c) exposure using a developer containing an organic solvent. A negative pattern forming method including the step of developing the film, wherein the actinic ray-sensitive or radiation-sensitive resin composition contains (G) a nitrogen atom, a fluorine atom, or a silicon atom. A negative pattern forming method comprising a non-polymeric compound having a molecular weight of 500 or more. [Selection figure] None |