http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017068257-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate | 2016-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_153d9ab45d90d19234e4e5282fb77563 |
publicationDate | 2017-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2017068257-A |
titleOfInvention | Resist composition and method for producing resist pattern |
abstract | An object of the present invention is to provide a resist composition capable of producing a resist pattern with good line edge roughness. A resist composition comprising a compound represented by formula (I), a resin having an acid labile group, and an acid generator. [In Formula (I), L 1 represents a divalent saturated hydrocarbon group having 1 to 12 carbon atoms. X 1 and X 2 are, independently of one another, * - CO-O -, * - O-CO -, * - represents a O-CO-O- or * group having -O-, * is the L 1 Represents the bond position. R 1 and R 2 each independently represent a fluorinated alkyl group having 1 to 8 carbon atoms. ] [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190082672-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102177417-B1 |
priorityDate | 2015-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 226.