http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019052140-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C271-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2018-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5a0f29773a00a81cffeccef5e6a21c8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2595ab13e9b3c971952caf770cb17f6e |
| publicationDate | 2019-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2019052140-A |
| titleOfInvention | Compound, resist composition and method for producing resist pattern |
| abstract | An object of the present invention is to provide a compound capable of producing a thick film resist pattern with an excellent focus margin, and a resist composition. A compound represented by formula (I). [In formula (I), R < 1 >, R < 2 > and R < 3 > respectively independently represent a C1-C12 alkyl group. Each R 4 independently represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. R 5 represents an alkyl group having 1 to 6 carbon atoms which may have a hydroxy group. R 6 represents a C 1-12 fluorinated hydrocarbon group. ] 【Selection chart】 None |
| priorityDate | 2017-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 215.