| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-114 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-18 |
| filingDate |
2013-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_794a42f06bbd27debbf06df93bcbde6b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb8e7c00a20f1d357fe250c094c8ca22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c40195fe0e6eb104c3f6cc23ff03c8c0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7feabab4404851399270b8110a2a8848 |
| publicationDate |
2013-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2013232016-A |
| titleOfInvention |
Photoresist composition comprising a blend of photoacid generators |
| abstract |
A novel photoresist composition comprising a blend of a resin binder and a photoacid generator is provided. A resin binder and a mixture of a photoacid generator compound in an amount sufficient to be able to develop an exposed coating layer of the composition, the mixture of photoacid generator compounds comprising: An acid generator and a second photoacid generator, wherein the first and second photoacid generators differ in pKa value by at least about 0.5 when photoactivated, and A photoresist composition that generates two photoacids, respectively. [Selection figure] None |
| priorityDate |
1999-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |