abstract |
(57) [Summary] (with correction) [PROBLEMS] To have excellent sensitivity and resolution, and to further expose-PE An object of the present invention is to provide a chemically amplified positive photoresist composition in which changes in resist performance such as T-top formation, DOF reduction, resolution degradation, and sensitivity degradation are small with the elapse of B. A resin containing a specific repeating structural unit, for example, a compound of the following formula (1), a compound capable of generating an acid upon irradiation with actinic rays or radiation, and a specific polyhydroxy compound, for example, a compound of the following formula (2) A positive photoresist composition, comprising: |