| abstract |
A polymer compound containing a repeating unit having a hydroxy group protected with an acetal protecting group that is decomposed by the action of an acid, an onium salt photoacid generator that generates sulfonic acid, and a carboxylic acid. A resist composition containing an onium salt-type photoacid generator. [Effect] Including a polymer compound containing a repeating unit in which a hydroxy group protected by an acetal protecting group that is decomposed by the action of an acid is acetal protected, a compound that generates sulfonic acid and a compound that generates carboxylic acid with high energy rays The resist film has the characteristics that the solubility of the unexposed part is high, the solubility of the exposed part is low and the dissolution contrast is high, and the nano edge roughness is reduced in the image formation of positive / negative reversal in development with an organic solvent, This makes it possible to form a fine hole pattern with high dimensional control and high sensitivity. [Selection] Figure 1 |