http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015172768-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2015-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_001acd2b0a91f42454c036017469437c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57d69c998ba644a25a483999a8d015ba http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fadaf59e22770e4ea9cec91a83c0621d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24ef466fc3607e925bf3e57161456513 |
| publicationDate | 2015-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2015172768-A |
| titleOfInvention | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and method for producing electronic device |
| abstract | [PROBLEMS] To suppress the generation of standing waves without forming an antireflection film, to form a highly rectangular pattern, to form a fine trench pattern, excellent in exposure latitude and LWR, Providing a pattern forming method capable of reducing development defects. A resin (A) having a repeating unit having a group capable of decomposing by the action of an acid to generate a polar group and a repeating unit having an aromatic group, a compound capable of generating an acid upon irradiation with actinic rays or radiation ( B) and a pattern forming method in which an actinic ray-sensitive or radiation-sensitive resin composition containing a solvent (C) is exposed and developed using a developer containing an organic solvent to form a negative pattern. The aromatic group of the resin (A) or the compound (D) contained in the actinic ray-sensitive or radiation-sensitive resin composition has a structure that absorbs specific ultraviolet rays. Forming method. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018004909-A |
| priorityDate | 2011-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.