| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F216-02 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F216-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-093
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2059
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 |
| filingDate |
2016-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2019-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2019-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101944585-B1 |
| titleOfInvention |
Poymer compound, positive resist composition, laminate, and resist patterning process |
| abstract |
The present invention provides a polymer compound having a very high resolution, a low LER, and suitable as a base resin of a resist composition capable of forming a resist film capable of forming a pattern having excellent rectangularity. The present invention relates to a resin composition containing a repeating unit represented by the following general formula (1c), a repeating unit represented by the following general formula (2) and a repeating unit represented by the following general formula (3) And the like. (Wherein M b + represents a sulfonium cation represented by the following formula (a) or an iodonium cation represented by the following formula (b).) |
| priorityDate |
2015-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |