| abstract |
Provided is a curable composition for imprints that has good pattern formability even after repeated pattern transfer and good line edge roughness after etching when used for substrate processing. A curable composition for imprints comprising (A) at least one polymerizable monomer and (B) a photopolymerization initiator, The polymerizable monomer (A) contains at least two fluorine-containing groups selected from a fluoroalkyl group and a fluoroalkyl ether group, and at least two of the fluorine-containing groups are linked having 2 or more carbon atoms. A curable composition for imprints, which is a compound separated by a group. [Selection figure] None |