| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2300-102
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2300-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24802 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-101
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F230-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-1006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-1025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J3-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J3-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-06 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-84 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-46 |
| filingDate |
2011-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79a4c297fe26465f427b7bf18a643a56 |
| publicationDate |
2012-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2012186356-A |
| titleOfInvention |
Curable composition for imprint, pattern forming method and pattern |
| abstract |
Kind Code: A1 A curable composition for imprints that has good pattern formability even when pattern transfer is performed at high speed, has few defects, and has good line edge roughness after etching when used in substrate processing applications. provide. A curable composition for imprints containing at least one polymerizable monomer (A) and a photopolymerization initiator (B), wherein the polymerizable monomer (A) comprises: A curable composition for imprints comprising a polymerizable monomer (Ax) having a hydrogen bonding functional group and a fluorine-containing group. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2018025739-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014157642-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014193970-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9353204-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10990011-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150102015-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150137049-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2015190479-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014074081-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102193400-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102101239-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018025739-A1 |
| priorityDate |
2011-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |