http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012216655-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2011-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90ec80617072eafbb618acf3e0418463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5a9a06240fa8dbb65b435fcdb378e74f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_55376e1837da0b73561c2a0779c62c21 |
| publicationDate | 2012-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2012216655-A |
| titleOfInvention | Radiation-sensitive composition for nanoimprint and pattern formation method |
| abstract | An object of the present invention is to provide a radiation-sensitive composition for nanoimprinting that sufficiently satisfies basic characteristics such as curability in pattern formation by a nanoimprinting method and that has excellent etching resistance, and a patterning method using the same. It is to be. The present invention is a radiation-sensitive composition for nanoimprinting, which contains a polymerizable compound containing a sulfur atom and a radiation-sensitive polymerization initiator. Moreover, the said polymeric compound containing a sulfur atom is good in it being a compound represented by following formula (1). [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022196408-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013047136-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014140016-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013074015-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014097761-A1 |
| priorityDate | 2011-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 310.