| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1818
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-1025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-102 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M7-0081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-101
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-102
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D7-40 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2015-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8d1a9f53b3909fe4bff7091e85364e5e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47a111168c8b618bd6b9b78cceed8289 |
| publicationDate |
2017-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20170084183-A |
| titleOfInvention |
Light-curable composition for imprint, pattern formation method, and device manufacturing method |
| abstract |
The present invention provides a photocurable composition for imprint, a pattern forming method, and a device manufacturing method which are excellent in durability and durability stability over time. The photocurable composition for imprints contains a monofunctional chain aliphatic (meth) acrylate (A1) containing no fluorine atom, a bifunctional or higher functional (meth) acrylate (A2) containing no fluorine atom, (A1) having a monofunctional (meth) acrylate (B) containing a fluorine atom and a photopolymerization initiator (C) containing no fluorine atom and having a monofunctionality of 0.67 kPa The monofunctional (meth) acrylate (B) having a fluorine atom has a boiling point of 100 to 200 DEG C under a pressure of 0.67 kPa. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200124261-A |
| priorityDate |
2014-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |