| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-1055 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0385 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2009-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d072f1629ca27adc6324af88e2d27d91
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d9a9c4596ed404a4ab04eef308be229b |
| publicationDate |
2010-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2010176012-A |
| titleOfInvention |
Positive resist composition and method for forming resist pattern using the same |
| abstract |
A positive resist composition capable of reducing the generation of residues after development of a resist film while maintaining good adhesion between the resist film and a substrate in order to form a fine resist pattern, and To provide a method for forming a resist pattern using the same. A positive resist composition containing (A) an alkali-soluble novolak resin, (B) a photosensitizer, and a predetermined (C) benzotriazole-based compound contains a predetermined benzotriazole-based compound. Adhesion between the film and the substrate is maintained well, a fine resist pattern can be formed, and generation of residues can be suppressed even after development of the resist film. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014178471-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210018118-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210142544-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017530377-A |
| priorityDate |
2009-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |