| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6b7947c26de6ffc9e68cec72b1f38479 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-085
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1998-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_22c84d9a1ebb4d2779f3f9c12ff53853
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_91d67122dd4d4dc22ddc1409910e204e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b67dbffea6ec7504024c309bcad994c2 |
| publicationDate |
2000-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2000171968-A |
| titleOfInvention |
Positive photoresist composition |
| abstract |
(57) [Summary] With respect to a basic composition comprising an alkali-soluble novolak-type resin and a quinonediazide group-containing compound, the general formula 1 represents 0.01 to 20 parts by weight per 100 parts by weight of the basic composition. A positive photoresist composition containing at least one selected from benzotriazoles (I). Embedded image [Effect] A resist pattern having excellent adhesion to various substrates in the production of semiconductor devices and TFTs (thin film transistors) during development and wet etching can be formed without impairing the storage stability of the resist. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102016618-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010176012-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100837042-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100523768-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101739587-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004109404-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006184660-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4543923-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004092839-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014178471-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160107767-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170014623-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004347617-A |
| priorityDate |
1998-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |