Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D249-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D403-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D249-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D403-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 |
filingDate |
1992-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e4eb526dd1ede469835cc80c2e01abf2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61eb1b5009be47cb05392bb6e31476c3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82d2e7bd7d775c3e6365dd10d40840a1 |
publicationDate |
1993-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-H05341509-A |
titleOfInvention |
Positive photoresist composition |
abstract |
(57) [Summary] [Object] To provide a positive photoresist composition capable of forming a resist pattern having extremely excellent dimensional stability. [Structure] The positive photosensitive resin composition contains a specific light absorber represented by the following general formula [I] or [II] in addition to a quinonediazide compound and an alkalizable soluble novolak resin. [Chemical 1] |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000081700-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010176012-A |
priorityDate |
1992-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |