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filingDate 1984-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1986-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S61113649-A
titleOfInvention Polymeric material composition with improved light resistance
abstract PURPOSE: To obtain a polymeric material composition with improved stability to light, by incorporating a polymeric material with a hindered amine light stabilizer and specific alkylidene bus (benzotriazolephenol) compound. n CONSTITUTION: The objective composition can be obtained by incorporating (A) 100pts.wt. of a polymeric material such as polypropylene or polyethylene with (B) 0.001W5pts.wt. of at least one sort of a hindered amine light stabilizer (e.g., 4-benzolyoxy-2,2,6,6-tetramethylpiperizine), (C) 0.001W5pts.wt. of at least one sort of compound of formula (RX is H or alkyl; R 2 is alkyl or aralkyl; X is H, halogen, alkyl, etc.) [e.g., 2,2'methylenebis(4-methyl-6- benzotriazolylphenol)] and, preferably, (D) such ingredients as phenolic antioxidant, sulfur-based antioxidant or phosphorus-contg. compound. n COPYRIGHT: (C)1986,JPO&Japio
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H05341509-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7018570-B2
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H01210445-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002363536-A
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