abstract |
A semiconductor device manufacturing method, a semiconductor device manufacturing apparatus, a control program, and a program storage medium capable of simplifying the process and reducing the manufacturing cost and improving the productivity as compared with the prior art. provide. A film forming step of forming a SiO 2 film 104 A on the pattern of the photoresist 103, and an etching step of etching to remain the SiO 2 film 104 only on the side wall portion of the pattern of the photoresist 103, the photo And removing the pattern of the resist 103 to form a pattern of the SiO 2 film 104. [Selection] Figure 1 |